Art & Environment Prize 2025 by Lee Ufan Arles Foundation and Guerlain – Call for International Artists
Applicant criteria
- 18 - 60
- Both
Opportunity description
The Lee Ufan Arles Foundation is an art institution established by the internationally renowned Korean-Japanese artist Lee Ufan in the city of Arles, in southern France. It is a contemporary art space that supports deep and reflective artistic creativity, with a strong focus on the relationship between humans, nature, and the environment.
The prestigious French house Guerlain, known worldwide in the fields of perfume and beauty, is also a committed institution promoting sustainability and environmental awareness through the arts.
The Art & Environment Prize (Prix Art & Environnement) is an annual award established in 2023 through a partnership between Lee Ufan Arles and Guerlain. It is granted to an artist whose work demonstrates philosophical depth and addresses themes related to nature, the environment, and humanity in a responsible and innovative way.
The prize aims to foster dialogue between art and the environment and to encourage artistic productions that respond to the challenges of the contemporary world through beauty, reflection, and responsibility.
Deadline for applications: July 30, 2025
Benefits
- A 6 to 8-week artist residency in Arles, France, in early 2026.
- Free housing and a professional production space.
- Artistic and professional support from the Lee Ufan Arles team, with opportunities to meet artists, curators, and local/international art institutions.
- A solo exhibition in one of the foundation’s spaces in summer 2026.
- International visibility and media exposure through the partnership with Guerlain.
Eligibility criteria
- Open to artists from all countries and disciplines.
- No age or academic degree requirements.
- Applicants must have:
At least one previous solo exhibition.
Participation in one or more group exhibitions.
- Submit an authentic, meaningful project aligned with the prize’s themes (art, environment, and philosophical reflection).